NY Creates President and CEO Dave Anderson shares his perspective on overcoming challenges for the semiconductor industry, the promise of High NA EUV lithography, and the power of collaboration in his recent article in Semiconductor Digest, “Meeting 2nm Node Challenges: Overcoming Scaling Limits Through High NA EUV and Ecosystem Collaboration.” Dave said, “By investing early in standard and high NA EUV lithography infrastructure, and by co-locating chipmakers, equipment suppliers, universities, and government programs under one roof, Creates is shortening the distance between laboratory breakthroughs and manufacturable processes.”