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RESOURCES

DIVE DEEPER.

Use this collection of resources to explore what NY CREATES has to offer.

Security Control Center

Non-Emergency
518-956-7082
518-437-7083
518-437-8600

Emergency
518-438-6752

NFE Visitor Desk
518-956-7123

Access Control Office
518-956-7090

EHS Contacts

Kassey Rydberg / AVP of Environmental, Health and Safety

518-380-1847 (Cell)
KRydberg@ny-creates.org

SAFETY ENGINEERING

Darren Brookhart / Sr. Safety Equipment Engineer
518-364-4345 (Cell)
DBrookhart@ny-creates.org

Priscilla LaFountain / Safety Engineer
518-728-3241 (Cell)
PLafountain@ny-creates.org

Glenn Matteson / Safety Engineer
518-225-9241 (Cell)
GMatteson@ny-creates.org

INDUSTRIAL HYGIENIST

Katlin Rhodes / IH / CSP
518- 641-2255 (Cell)
KRhodes@ny-creates.org

Sean Gavaghan
518-603-0305 (Cell)
SGavaghan@ny-creates.org

ENVIRONMENTAL ENGINEERING

Tina Ovitt / Environmental Engineer (Waste and Wastewater programs)
518-704-5697 (Cell)
TOvitt@ny-creates.org

Whitney Crowe / Environmental Engineer (Air, CBS, PBS and Stormwater programs)
WCrowe@ny-creates.org
518-918-6771 (Cell) 

ERT SUPERVISOR

Jeremy Valason
518-380-3024 Cell)
JValason@ny-creates.org

EHS TECHNICIAN

Jake Stern / EHS Technician
518-948-2991 (Cell) 
JStern@ny-creates.org

EHS CLERK

Lynda Seiling / EHS Clerk
LSeiling@ny-creates.org 
518-603-3905 (Cell)

Contact Paul Butler, EHS Admin, at PButler@ny-creates.org to set-up appointments with any member of the EHS office.

Receiving Monday through Friday from 6:30 AM – 3:30 PM.

Shipping and Receiving:
518-437-8643
cnseshippingandreceiving@ny-creates.org

Please click here to access the full list of available policies, procedures and forms.

Selected publications co-authored by NY CREATES researchers in integrated photonics, superconducting qubits, neuromorphic computing, and advanced process technologies:

“Ultrathin TaN Damascene Nanowire Structures on 300-mm Si Wafers for Quantum Applications,” E. Bhatia et al., IEEE Transactions on Quantum Engineering, 4, pp. 1-8 (2023) (https://doi.org/10.1109/TQE.2023.3289257)

Engineering of Niobium Surfaces Through Accelerated Neutral Atom Beam Technology For Quantum Applications, S.Kar et al. Journal of Applied Physics, 134 (2): 025301. (2023) (https://doi.org/10.1063/5.0153617)

Chemical Mechanical Planarization for Ta-based Superconducting Quantum Devices, E. Bhatia et al. Journal of Vacuum Science & Technology B, 41 (3): 033202. (2023) (https://doi.org/10.1116/6.0002586)

Copper Encapsulated Ultra-Thin NbN Films and Damascene Structures on 300 mm Si Wafers, S. Kar et al. IEEE Transactions on Applied Superconductivity, vol. 33, no. 5, pp. 1-5, (2023) (https://ieeexplore.ieee.org/document/10052722)

Optimization of photoluminescence from W centers in silicon-on-insulator, S. Buckley et al. Optics Express Vol. 28, Issue 11, pp. 16057-16072 (2020) (https://opg.optica.org/oe/fulltext.cfm?uri=oe-28-11-16057&id=431765)

Microring resonator-coupled photoluminescence from silicon W~ centers, A. Tait et al, Journal of Physics: Photonics, Volume 2, Number 4
(2020) (https://iopscience.iop.org/article/10.1088/2515-7647/ab95f2)

Foundry capabilities for photonic integrated circuits, M. Liehr et al, Optical Fiber Telecommunications VII, pp. 143-193, (2020) (https://www.sciencedirect.com/science/article/pii/B978012816502700004X)

Through Oxide Via (TOV) Induced Fabrication Stress on Directional Couplers in a Si Photonic Interposer, E. Graham et al. IEEE Albany Nanotechnology Symposium (ANS), Albany, NY, USA, pp. 1-4 (2019) (https://ieeexplore.ieee.org/abstract/document/8963742)

CMOS-Compatible Optical Phased Array Powered by a Monolithically-Integrated Erbium Laser, J. Notaros et al Jour. of Lightwave Tech. vol. 37 (24) pp. 5982-5987 (2019) (https://www.osapublishing.org/jlt/abstract.cfm?uri=jlt-37-24-5982)

A Single-Chip Optical Phased Array in a 3D-Integrated Silicon Photonics/65nm CMOS Technology, T. Kim et al, 2019 IEEE International Solid State Circuits Conference – (ISSCC), San Francisco, CA, USA, pp. 464-466 (2019) (https://ieeexplore.ieee.org/abstract/document/8662473)

The AIM Photonics MPW: A Highly Accessible Cutting Edge Technology for Rapid Prototyping of Photonic Integrated Circuits, N. Fahrenkopf et al, IEEE Journal of Selected Topics in Quantum Electronics, vol. 25 (5), pp. 1-6, (2019) (https://ieeexplore.ieee.org/document/8807165)

Fabrication and Performance of Hybrid ReRAM-CMOS Circuit Elements for Dynamic Neural Networks, M. Liehr et al, ICONS ’19: Proceedings of the International Conference on Neuromorphic Systems, Article No. 6 pp. 1–4 (2019) (https://dl.acm.org/doi/10.1145/3354265.3354271)

Development of transmon qubits solely from optical lithography on 300 mm wafers, N. Foroozani et al, Quantum Science & Technology vol. p.025012 (2019)(https://iopscience.iop.org/article/10.1088/2058-9565/ab0ca8/pdf)

Materials and Processes for Superconducting Qubits and Superconducting Electronic Circuits on 300mm Wafers, S. Papa Rao et al, ECS Transactions  85 (6) p. 151  (2018) (http://ecst.ecsdl.org/content/85/6/151.abstract)

Integrating photonics with silicon nanoelectronics for the next generation of systems on a chip, A. Atabaki et al, Nature vol. 556, pp. 349–354 (2018) (https://doi.org/10.1038/s41586-018-0028-z)

Octave-spanning coherent supercontinuum generation in silicon on insulator from 1.06 μm to beyond 2.4 μm, N. Singh et al. Light Sci. & Appl. vol 7, p.17131 (2018) (https://www.nature.com/articles/lsa2017131)

Broadband 2-µm emission on silicon chips: monolithically integrated Holmium lasers, N. Li et al, Optics Express vol. 26 (3), pp. 2220-2230 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-3-2220)

Monolithically integrated erbium-doped tunable laser on a CMOS-compatible silicon photonics platform, N. Li et al, Optics Express vol. 26 (13), pp. 16200-16211 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-13-16200)

High positional freedom SOI subwavelength grating coupler (SWG) for 300 mm foundry fabrication, E. Ong et al, Optics Express vol. 26 (22), pp. 28773-28792 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-22-28773)

SiNx bilayer grating coupler for photonic systems, E. Ong et al. OSA Continuum vol. 1 (1), pp. 13-25 (2018) (https://www.osapublishing.org/osac/abstract.cfm?uri=osac-1-1-13)

High-power thulium lasers on a silicon photonics platform, N. Li et al Optics Letters vol. 42 (6), pp. 1181-1184 (2017) (https://www.osapublishing.org/ol/abstract.cfm?uri=ol-42-6-1181)

Mode-evolution-based coupler for high saturation power Ge-on-Si photodetectors, M. Byrd et al, Optics Letters vol. 42 (4), pp. 851-854 (2017) (https://www.osapublishing.org/ol/abstract.cfm?uri=ol-42-4-851)

Demonstrating Manufacturability of Atomic Level Etch (ALE) through Accelerated Neutral Atom Beam (ANAB) Processing D.Steinke et alALD/ALE Workshop, Denver, CO (2017) (http://www.neutralphysics.com/wp-content/uploads/2017/07/Atomic-Layer-Etch-Workshop-Denver-July15-18-2017-SaP11-DRSteinke.pdf)

Second-Order Wavelength-Selective Partial-Drop Multicast Filter Bank, Z. Su et al, Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF), OSA technical Digest (online) paper ITu1B.7 (2016) (https://www.osapublishing.org/abstract.cfm?uri=IPRSN-2016-ITu1B.7)

Mode-evolution based coupler for Ge-on-Si photodetectors, M. Byrd et al, 2016 IEEE Photonics Conference (IPC), Waikoloa, HI,  pp. 252-253 (2016) (https://ieeexplore.ieee.org/abstract/document/7831065)

Ultra-Compact CMOS-Compatible Ytterbium Microlaser, Z. Su et al. Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF), OSA technical Digest (online) paper IW1A.3 (2016) (https://www.osapublishing.org/viewmedia.cfm?uri=IPRSN-2016-IW1A.3&seq=0)

Nanophotonic phased array for visible light image projection, M. Raval et al, 2016 IEEE Photonics Conference (IPC), Waikoloa, HI, pp. 206-207 (2016) (https://ieeexplore.ieee.org/abstract/document/7831042)

Accelerated Neutral Atom Beam (ANAB) Processing for Atomic Layer Etch (ALE) E. Barth et al, ALD/ALE Workshop, Dublin, Ireland (2016)  (http://www.neutralphysics.com/wp-content/uploads/2016/08/2016-07-21AcceleratedNeutralAtomBeamProcessingforALE.pdf)

Badging Process

1. Authorized Sponsor submits badge request form to accesscontrol@sunypoly.edu.

  • Use your legal name on the badge request and to sign up for training. This name will be on your license/identification card.
  • Include your e-mail on the badge form – be accurate

2. View the online Safety Orientation and other applicable required training below. Complete the online test(s) below and submit it to sunypolyehs@sunypoly.edu.

3. After completing Safety Orientation, accesscontrol@sunypoly.edu will e-mail you when your badge is ready. Badges can be picked up at the security badging office in the NFE rotunda between  8 a.m. and 12 noon Monday through Friday or by appointment.

If you have not received your badge in 5 business days, contact your SPONSOR to inquire about the badge.

Online Training

Important! Open and read: Instructions for Downloading and Submitting Test (PDF)

If your test is not opened and submitted correctly, it can delay receiving access to the site.

PowerPoint Link (by Subject)Test LinkTraining Requirement
Safety Orientation (pdf)Test (pdf)Safety Orientation is required for anyone working on the Albany Nanotech Complex or anyone who has been off the Albany Nanotech Complex for more than two years.
Online Lab Safety (pptx)Test (pdf)For employees or students who work in laboratories
Cleanroom Safety (pdf)Test (pdf)Cleanroom Safety is required for anyone working in the cleanrooms and/or HPM area.
Contractor Safety Guide for the Albany Nanotech Complex and Kiernan Plaza (pdf)Read the Contractor Safety Guide for the Albany Nanotech Complex and Kiernan Plaza (pdf)

Required initially for any:

  • Contractor working on the Albany Nanotech Complex and Kiernan Plaza

OR

  • Technical Coordinator (TC) person who is responsible for maintaining technical liaison with the Contractor
  1. Employers (e.g., contractors, business partners, tenants) are responsible for providing their company training and/or job-specific training and the Personal Protective Equipment (PPE) for their employees
  2. Visit Resources – POLICIES, PROCEDURES AND FORMS for detailed instructions and requirements
  3. If you have any questions about training contact your manager, work sponsor or sunypolyehs@sunypoly.edu
  4. For task specific training (e.g., Hazardous Waste Handling) for contractors or business partners, contact your sponsor, manager and/or create an intranet account

White paper describing the American Semiconductor Innovation Coalition (ASIC) vision for the National Semiconductor Technology Center (NSTC). NY CREATES is a founding member of ASIC.

Response to Department of Commerce Bureau of Industry and Security Request for Comments on “Risks in the Semiconductor Manufacturing and Advanced Packaging Supply Chain”

Response to the ARO/LPS RFI on Qubits For Computing Foundry (QCF)

Response to DOE RFI on Quantum Information Science Research Centers
https://www.regulations.gov/document?D=DOE-HQ-2019-0025-0034

Response to DOE RFI on Microelectronics
https://www.regulations.gov/document?D=DOE-HQ-2019-0031-0008

FEATURED NEWS

Explore Recent News

Review upcoming topics and learn about
speakers featured in our Emergent Technologies Seminar Series. 

RELATED RESOURCES

Dive Deeper

Learn about the latest technologies with presentations and papers co-authored by members of the NY CREATES team. 

PLAN A VISIT

Go Behind The Scenes

Start your NY CREATES dialogue with a few words about your technology and collaborative interests using the link below.