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Response to DOE RFI on Quantum Information Science Research Centers
https://www.regulations.gov/document?D=DOE-HQ-2019-0025-0034

Response to DOE RFI on Microelectronics
https://www.regulations.gov/document?D=DOE-HQ-2019-0031-0008

Selected publications co-authored by NY CREATES researchers in integrated photonics, superconducting qubits, neuromorphic computing, and advanced process technologies:

 

CMOS-Compatible Optical Phased Array Powered by a Monolithically-Integrated Erbium Laser, J. Notaros et al Jour. of Lightwave Tech. vol. 37 (24) pp. 5982-5987 (2019)(https://www.osapublishing.org/jlt/abstract.cfm?uri=jlt-37-24-5982)

Octave-spanning coherent supercontinuum generation in silicon on insulator from 1.06 μm to beyond 2.4 μm, N. Singh et al. Light Sci. & Appl. vol 7, p.17131 (2018) (https://www.nature.com/articles/lsa2017131)

Through Oxide Via (TOV) Induced Fabrication Stress on Directional Couplers in a Si Photonic Interposer, E. Graham et al. IEEE Albany Nanotechnology Symposium (ANS), Albany, NY, USA, pp. 1-4 (2019) (https://ieeexplore.ieee.org/abstract/document/8963742)

Second-Order Wavelength-Selective Partial-Drop Multicast Filter Bank, Z. Su et al, Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF), OSA technical Digest (online) paper ITu1B.7 (2016) (https://www.osapublishing.org/abstract.cfm?uri=IPRSN-2016-ITu1B.7)

Mode-evolution based coupler for Ge-on-Si photodetectors, M. Byrd et al, 2016 IEEE Photonics Conference (IPC), Waikoloa, HI,  pp. 252-253 (2016) (https://ieeexplore.ieee.org/abstract/document/7831065)

High-power thulium lasers on a silicon photonics platform, N. Li et al Optics Letters vol. 42 (6), pp. 1181-1184 (2017)(https://www.osapublishing.org/ol/abstract.cfm?uri=ol-42-6-1181)

Broadband 2-µm emission on silicon chips: monolithically integrated Holmium lasers, N. Li et al, Optics Express vol. 26 (3), pp. 2220-2230 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-3-2220)

Ultra-Compact CMOS-Compatible Ytterbium Microlaser, Z. Su et al. Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF), OSA technical Digest (online) paper IW1A.3 (2016) (https://www.osapublishing.org/viewmedia.cfm?uri=IPRSN-2016-IW1A.3&seq=0)

SiNx bilayer grating coupler for photonic systems, E. Ong et al. OSA Continuum vol. 1 (1), pp. 13-25 (2018)(https://www.osapublishing.org/osac/abstract.cfm?uri=osac-1-1-13)

High positional freedom SOI subwavelength grating coupler (SWG) for 300 mm foundry fabrication, E. Ong et al, Optics Express vol. 26 (22), pp. 28773-28792 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-22-28773)

Nanophotonic phased array for visible light image projection, M. Raval et al, 2016 IEEE Photonics Conference (IPC), Waikoloa, HI, pp. 206-207 (2016) (https://ieeexplore.ieee.org/abstract/document/7831042)

Mode-evolution-based coupler for high saturation power Ge-on-Si photodetectors, M. Byrd et al, Optics Letters vol. 42 (4), pp. 851-854 (2017) (https://www.osapublishing.org/ol/abstract.cfm?uri=ol-42-4-851)

Monolithically integrated erbium-doped tunable laser on a CMOS-compatible silicon photonics platform, N. Li et al, Optics Express vol. 26 (13), pp. 16200-16211 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-13-16200)

Foundry capabilities for photonic integrated circuits, M. Liehr et al, Optical Fiber Telecommunications VII, pp. 143-193, (2020) (https://www.sciencedirect.com/science/article/pii/B978012816502700004X)

A Single-Chip Optical Phased Array in a 3D-Integrated Silicon Photonics/65nm CMOS Technology, T. Kim et al, 2019 IEEE International Solid State Circuits Conference – (ISSCC), San Francisco, CA, USA, pp. 464-466 (2019) (https://ieeexplore.ieee.org/abstract/document/8662473)

The AIM Photonics MPW: A Highly Accessible Cutting Edge Technology for Rapid Prototyping of Photonic Integrated Circuits, N. Fahrenkopf et al, IEEE Journal of Selected Topics in Quantum Electronics, vol. 25 (5), pp. 1-6, (2019) (https://ieeexplore.ieee.org/document/8807165)

Integrating photonics with silicon nanoelectronics for the next generation of systems on a chip, A. Atabaki et al, Nature vol. 556, pp. 349–354 (2018) (https://doi.org/10.1038/s41586-018-0028-z)

Fabrication and Performance of Hybrid ReRAM-CMOS Circuit Elements for Dynamic Neural Networks, M. Liehr et al, ICONS ’19: Proceedings of the International Conference on Neuromorphic Systems, Article No. 6 pp. 1–4 (2019) (https://dl.acm.org/doi/10.1145/3354265.3354271)

Microring resonator-coupled photoluminescence from silicon W~ centers, A. Tait et al, arXiv:2001.05100 [physics.optics] (https://arxiv.org/abs/2001.05100)

Optimization of photoluminescence from W centers in silicon-on-insulator, S. Buckley et al. arXiv:1911.01317 [physics.app-ph]  (https://arxiv.org/abs/1911.01317)

Development of transmon qubits solely from optical lithography on 300 mm wafers, N. Foroozani et al, Quantum Science & Technology vol. 4 p.025012 (2019) (https://iopscience.iop.org/article/10.1088/2058-9565/ab0ca8/pdf)

Materials and Processes for Superconducting Qubits and Superconducting Electronic Circuits on 300mm Wafers, S. Papa Rao et al, ECS Transactions  85 (6) p. 151  (2018) (http://ecst.ecsdl.org/content/85/6/151.abstract)

Demonstrating Manufacturability of Atomic Level Etch (ALE) through Accelerated Neutral Atom Beam (ANAB) Processing D.Steinke et al, ALD/ALE Workshop, Denver, CO (2017) (http://www.neutralphysics.com/wp-content/uploads/2017/07/Atomic-Layer-Etch-Workshop-Denver-July15-18-2017-SaP11-DRSteinke.pdf)

Accelerated Neutral Atom Beam (ANAB) Processing for Atomic Layer Etch (ALE) E. Barth et al, ALD/ALE Workshop, Dublin, Ireland (2016) (http://www.neutralphysics.com/wp-content/uploads/2016/08/2016-07-21AcceleratedNeutralAtomBeamProcessingforALE.pdf)

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