Use this collection of resources to explore what NY CREATES has to offer.
NY CREATES’ Albany Nanotech Complex is able to facilitate all types of events on site. The wide range of venues are ideal for educational programs, training sessions, board meetings, symposia and conferences.
You can choose from a variety of spaces which include: two auditoriums, three meeting rooms, two rotundas, and a large atrium that can accommodate up to 600 people. During the summer months, additional space is available via classrooms.
Additionally, an on-site caterer can work directly with you on your catering needs.
For more information and to schedule a site visit, please contact Tenant Relations at firstname.lastname@example.org.
NanoFab South Auditorium
Located in NanoFab South, building 255, the South Auditorium features a user-friendly touch screen, built-in state-of-the-art audio visual capabilities, retractable screen, and complimentary WiFi enabling quick and easy internet access. The auditorium seats up to 250 people with outlets in every other row for convenient cell phone and laptop charging.
The rotunda area outside the South Auditorium is ideal for receptions, networking and registration.
Audio Visual: Built in audio visual system, projector, retractable screen, podium with VGA hookup, stationary microphone and two handheld microphones.
Located inside CESTM, building 251, the CESTM Auditorium is equipped with audio visual and projection capabilities. It is the perfect venue for small scale conferences, meetings, and panel discussions.
The rotunda area outside the CESTM Auditorium is perfect for registration and sit-down meals.
Audio Visual: Built in audio visual system, projector, retractable screen, Wi-Fi, and a podium with VGA hookup.
Located on the 3rd floor of ZEN, building 201 the ZEN Atrium is a beautiful wide-open modern space that can accommodate up to 600 people.
Time Frame: Please note events cannot be booked past 11 p.m.
Designed for smaller gatherings and “break-out” sessions the NFC Boardroom is equipped with audio-visual capabilities and a white board. The room seats 14 around the board table with space around the perimeter for up to 25 people.
Please click here to access the full list of available policies, procedures and forms.
1. Authorized Sponsor submits badge request form to email@example.com.
- Use your legal name on the badge request and to sign up for training. This name will be on your license/identification card.
- Include your e-mail on the badge form – be accurate
2. View the online Safety Orientation and other applicable required training below. Complete the online test(s) below and submit it to firstname.lastname@example.org.
3. After completing Safety Orientation, email@example.com will e-mail you when your badge is ready. Badges can be picked up at the security badging office in the NFE rotunda between 8 a.m. and 12 noon Monday through Friday or by appointment.
If you have not received your badge in 5 business days, contact your SPONSOR to inquire about the badge.
Important! Open and read: Instructions for Downloading and Submitting Test (PDF)
If your test is not opened and submitted correctly, it can delay receiving access to the site.
|PowerPoint Link (by Subject)||Test Link||Training Requirement|
|Safety Orientation (pdf)||Test (pdf)||Safety Orientation is required for anyone working on the Albany Nanotech Complex or anyone who has been off the Albany Nanotech Complex for more than two years.|
|Online Lab Safety (pptx)||Test (pdf)||For employees or students who work in laboratories|
|Cleanroom Safety (pdf)||Test (pdf)||Cleanroom Safety is required for anyone working in the cleanrooms and/or HPM area.|
|Contractor Safety Guide for the Albany Nanotech Complex and Kiernan Plaza (pdf)||Read the Contractor Safety Guide for the Albany Nanotech Complex and Kiernan Plaza (pdf)|
Required initially for any:
- Employers (e.g., contractors, business partners, tenants) are responsible for providing their company training and/or job-specific training and the Personal Protective Equipment (PPE) for their employees
- Visit Resources – POLICIES, PROCEDURES AND FORMS for detailed instructions and requirements
- If you have any questions about training contact your manager, work sponsor or firstname.lastname@example.org
- For task specific training (e.g., Hazardous Waste Handling) for contractors or business partners, contact your sponsor, manager and/or create an intranet account
Tom Diamond CIH / VP for Environmental, Health, and Safety and Facilities Engineering
Kassey Rydberg / AVP of Environmental, Health and Safety
Darren Brookhart / Sr. Safety Equipment Engineer
Priscilla LaFountain / Safety Engineer
Katlin Rhodes / IH / CSP
518- 641-2255 (Cell)
Tina Ovitt / Environmental Engineer (Waste and Wastewater programs)
Whitney Crowe / Environmental Engineer (Air, CBS, PBS and Stormwater programs)
Contact Paul Butler, EHS Admin, at SUNYPOLYEHS@SUNYPOLY.EDU to set-up appointments with any member of the EHS office.
General Questions: SUNYPOLYEHS@sunypoly.edu
White paper describing the American Semiconductor Innovation Coalition (ASIC) vision for the National Semiconductor Technology Center (NSTC). NY CREATES is a founding member of ASIC.
Response to Department of Commerce Bureau of Industry and Security Request for Comments on “Risks in the Semiconductor Manufacturing and Advanced Packaging Supply Chain”
Response to DOE RFI on Quantum Information Science Research Centers
Response to DOE RFI on Microelectronics
Selected publications co-authored by NY CREATES researchers in integrated photonics, superconducting qubits, neuromorphic computing, and advanced process technologies:
CMOS-Compatible Optical Phased Array Powered by a Monolithically-Integrated Erbium Laser, J. Notaros et al Jour. of Lightwave Tech. vol. 37 (24) pp. 5982-5987 (2019)(https://www.osapublishing.org/jlt/abstract.cfm?uri=jlt-37-24-5982)
Octave-spanning coherent supercontinuum generation in silicon on insulator from 1.06 μm to beyond 2.4 μm, N. Singh et al. Light Sci. & Appl. vol 7, p.17131 (2018) (https://www.nature.com/articles/lsa2017131)
Through Oxide Via (TOV) Induced Fabrication Stress on Directional Couplers in a Si Photonic Interposer, E. Graham et al. IEEE Albany Nanotechnology Symposium (ANS), Albany, NY, USA, pp. 1-4 (2019) (https://ieeexplore.ieee.org/abstract/document/8963742)
Second-Order Wavelength-Selective Partial-Drop Multicast Filter Bank, Z. Su et al, Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF), OSA technical Digest (online) paper ITu1B.7 (2016) (https://www.osapublishing.org/abstract.cfm?uri=IPRSN-2016-ITu1B.7)
Mode-evolution based coupler for Ge-on-Si photodetectors, M. Byrd et al, 2016 IEEE Photonics Conference (IPC), Waikoloa, HI, pp. 252-253 (2016) (https://ieeexplore.ieee.org/abstract/document/7831065)
High-power thulium lasers on a silicon photonics platform, N. Li et al Optics Letters vol. 42 (6), pp. 1181-1184 (2017)(https://www.osapublishing.org/ol/abstract.cfm?uri=ol-42-6-1181)
Broadband 2-µm emission on silicon chips: monolithically integrated Holmium lasers, N. Li et al, Optics Express vol. 26 (3), pp. 2220-2230 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-3-2220)
Ultra-Compact CMOS-Compatible Ytterbium Microlaser, Z. Su et al. Advanced Photonics 2016 (IPR, NOMA, Sensors, Networks, SPPCom, SOF), OSA technical Digest (online) paper IW1A.3 (2016) (https://www.osapublishing.org/viewmedia.cfm?uri=IPRSN-2016-IW1A.3&seq=0)
SiNx bilayer grating coupler for photonic systems, E. Ong et al. OSA Continuum vol. 1 (1), pp. 13-25 (2018)(https://www.osapublishing.org/osac/abstract.cfm?uri=osac-1-1-13)
High positional freedom SOI subwavelength grating coupler (SWG) for 300 mm foundry fabrication, E. Ong et al, Optics Express vol. 26 (22), pp. 28773-28792 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-22-28773)
Nanophotonic phased array for visible light image projection, M. Raval et al, 2016 IEEE Photonics Conference (IPC), Waikoloa, HI, pp. 206-207 (2016) (https://ieeexplore.ieee.org/abstract/document/7831042)
Mode-evolution-based coupler for high saturation power Ge-on-Si photodetectors, M. Byrd et al, Optics Letters vol. 42 (4), pp. 851-854 (2017) (https://www.osapublishing.org/ol/abstract.cfm?uri=ol-42-4-851)
Monolithically integrated erbium-doped tunable laser on a CMOS-compatible silicon photonics platform, N. Li et al, Optics Express vol. 26 (13), pp. 16200-16211 (2018) (https://www.osapublishing.org/oe/abstract.cfm?uri=oe-26-13-16200)
Foundry capabilities for photonic integrated circuits, M. Liehr et al, Optical Fiber Telecommunications VII, pp. 143-193, (2020) (https://www.sciencedirect.com/science/article/pii/B978012816502700004X)
A Single-Chip Optical Phased Array in a 3D-Integrated Silicon Photonics/65nm CMOS Technology, T. Kim et al, 2019 IEEE International Solid State Circuits Conference – (ISSCC), San Francisco, CA, USA, pp. 464-466 (2019) (https://ieeexplore.ieee.org/abstract/document/8662473)
The AIM Photonics MPW: A Highly Accessible Cutting Edge Technology for Rapid Prototyping of Photonic Integrated Circuits, N. Fahrenkopf et al, IEEE Journal of Selected Topics in Quantum Electronics, vol. 25 (5), pp. 1-6, (2019) (https://ieeexplore.ieee.org/document/8807165)
Integrating photonics with silicon nanoelectronics for the next generation of systems on a chip, A. Atabaki et al, Nature vol. 556, pp. 349–354 (2018) (https://doi.org/10.1038/s41586-018-0028-z)
Fabrication and Performance of Hybrid ReRAM-CMOS Circuit Elements for Dynamic Neural Networks, M. Liehr et al, ICONS ’19: Proceedings of the International Conference on Neuromorphic Systems, Article No. 6 pp. 1–4 (2019) (https://dl.acm.org/doi/10.1145/3354265.3354271)
Microring resonator-coupled photoluminescence from silicon W~ centers, A. Tait et al, arXiv:2001.05100 [physics.optics] (https://arxiv.org/abs/2001.05100)
Optimization of photoluminescence from W centers in silicon-on-insulator, S. Buckley et al. arXiv:1911.01317 [physics.app-ph] (https://arxiv.org/abs/1911.01317)
Development of transmon qubits solely from optical lithography on 300 mm wafers, N. Foroozani et al, Quantum Science & Technology vol. 4 p.025012 (2019) (https://iopscience.iop.org/article/10.1088/2058-9565/ab0ca8/pdf)
Materials and Processes for Superconducting Qubits and Superconducting Electronic Circuits on 300mm Wafers, S. Papa Rao et al, ECS Transactions 85 (6) p. 151 (2018) (http://ecst.ecsdl.org/content/85/6/151.abstract)
Demonstrating Manufacturability of Atomic Level Etch (ALE) through Accelerated Neutral Atom Beam (ANAB) Processing D.Steinke et al, ALD/ALE Workshop, Denver, CO (2017) (http://www.neutralphysics.com/wp-content/uploads/2017/07/Atomic-Layer-Etch-Workshop-Denver-July15-18-2017-SaP11-DRSteinke.pdf)
Accelerated Neutral Atom Beam (ANAB) Processing for Atomic Layer Etch (ALE) E. Barth et al, ALD/ALE Workshop, Dublin, Ireland (2016) (http://www.neutralphysics.com/wp-content/uploads/2016/08/2016-07-21AcceleratedNeutralAtomBeamProcessingforALE.pdf)
NY CREATES has issued a Request for Proposals (RFP) for a project that will expand the Albany Nanotech Complex, including new cleanroom space, a parking garage, and infrastructure improvements.
Responses are due by July 11, 2022, at 3PM.
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