Brookhaven Lab and Creates Collaborative Research: A Silicon-Compatible Path Toward Scalable Quantum Systems

NY Creates Research News Graphic

View Original Brookhaven National Laboratory News Release Here

Brookhaven Lab researchers built superconducting quantum devices using a new material and a technique adapted from electronics manufacturing processes

Beginning in the 1950s, silicon transformed the electronics industry by enabling smaller and faster devices that could be reliably manufactured at scale. More than six decades later, silicon-based semiconductors remain at the heart of many modern technologies, including so-called “classical” computers.

In pursuit of new quantum technologies, scientists and engineers have turned to specialized materials for building qubits — the fundamental components of quantum systems. For example, many qubits are made from superconducting materials deposited on sapphire substrates. But transitioning from laboratory demonstrations to scalable systems will require scientific and manufacturing infrastructure capable of supporting robust and reliable qubit fabrication.

Marking a milestone toward bridging that gap, researchers at the U.S. Department of Energy’s (DOE) Brookhaven National Laboratory have built superconducting quantum interference devices (SQUIDs) using a silicon-compatible class of materials called transition metal silicides. The research was conducted as part of the Co-design Center for Quantum Advantage (C2QA), a recently renewed National Quantum Information Science Research Center led by Brookhaven Lab.

“Making quantum devices with transition metal silicides is an approach that’s designed to feed right into the engine that’s been used for semiconductor technology,” said Charles Black, C2QA director, deputy associate laboratory director for Brookhaven’s Energy and Photon Sciences Directorate, and co-lead author on the paper that recently published in Nano Letters.

The researchers collaborated closely with NY Creates, a C2QA partner, to develop a fabrication process informed by advanced microelectronics manufacturing techniques. Using the lithography and etching capabilities available in the nanofabrication facility at the Center for Functional Nanomaterials (CFN) — a DOE Office of Science user facility at Brookhaven Lab — the researchers adapted a technique that is regularly used to synthesize the transition metal silicides used in microprocessors.

“We took this manufacturing-friendly approach so that, in the future, we could implement it at larger scales in the NY Creates facility,” explained Mingzhao Liu, a senior scientist at CFN, C2QA researcher, and co-lead paper author.

In this work, the researchers fabricated each SQUID with two superconducting constriction junctions, rather than using more conventional Josephson junctions, which have two superconducting layers separated by an insulator. The authors previously proposed that this architecture, in which the superconducting layers are connected by a thin wire, has potential to make transmon qubits more amenable to mass production. This new work marks their first experimental demonstration of constrictions in functioning quantum devices.

The SQUIDs served as a diagnostic tool, offering insights into how the constriction junctions were operating. Using CFN’s low-temperature measurement capabilities, the researchers cooled the devices to ultracold temperatures as low as 350 millikelvin and measured how current flowed through the SQUIDs under different applied magnetic fields.

“We learned that the design of the device as a whole can dampen the performance of the constriction junction,” Liu said. “But overall, the experiments showed us that the constriction junctions exhibit key properties, like nonlinearity, that are required for high-performing qubits.”

PtSi nanowire with labels.png

From nanoscale measurements to center wide collaboration

Advances like this are enabled by the integrated, multidisciplinary approach inherent to C2QA. By uniting expertise and infrastructure from national laboratories, universities, applied research and development organizations, and industry, the Center is accelerating progress toward high-performing qubits made from manufacturable, silicon-based materials.

SEM with labels.png

Ekta Bhatia, NY Creates research scientist in quantum technologies and co-author on the paper remarked, “This publication reflects the power of our strong partnership with Brookhaven under C2QA and accelerates the development of scalable quantum computing. We look forward to building on this work with Brookhaven to drive quantum innovation together.”

Beyond the Brookhaven-NY Creates collaboration, other C2QA researchers continue to deliver breakthroughs in silicon-based quantum devices. In November 2025, for example, C2QA researchers at Princeton University reported record-breaking coherence times in superconducting qubits built on top of silicon substrates, demonstrating that silicon-based platforms can rival and surpass more traditional sapphire platforms.

By approaching the scaling problem from several perspectives — including device design, materials science, and large-scale manufacturing — C2QA researchers are delivering a synergistic impact that is greater than the sum of their individual achievements.

Black said, “We’re developing a pipeline to take advantage of the strengths of each C2QA partner — and making strides toward scalable quantum systems.”

C2QA is supported by the DOE Office of Science.

Brookhaven National Laboratory is supported by the Office of Science of the U.S. Department of Energy. The Office of Science is the single largest supporter of basic research in the physical sciences in the United States and is working to address some of the most pressing challenges of our time. For more information, visit science.energy.gov. Follow @BrookhavenLab on social media. Find us on InstagramLinkedInX, and Facebook.

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Governor Hochul Announces NY Creates Begins Installation of the First Major Tool for High NA EUV Lithography Center at Albany NanoTech Complex

TEL track being installed in NanoFab Reflection at NY Creates Albany NanoTech Complex
TEL track being installed in NanoFab Reflection at NY Creates Albany NanoTech Complex

View the original Office of Governor Kathy Hochul News Release here.

Arrival of Tokyo Electron’s CLEAN TRACK™ LITHIUS Pro DICE™ Marks Milestone as New Center Prepares To Lead the Nation in the Future of Semiconductor Chip R&D

Governor Kathy Hochul today announced the beginning of installation of Tokyo Electron’s leading-edge 300mm wafer coater/developer system designed to support the next generation of semiconductor manufacturing at NY Creates’ Albany NanoTech Complex. This tool, called the CLEAN TRACK™ LITHIUS Pro DICE™, applies and processes a light-sensitive layer on silicon wafers, which is the platform upon which computer chips are built. This allows researchers to fabricate the minute patterns needed for the next generation of advanced processors, memory, sensors and more. This is the first major piece of equipment to be delivered for the forthcoming High NA Extreme Ultraviolet (EUV) Lithography Center at Albany NanoTech, which will be North America’s first and only publicly owned, accessible High NA EUV Lithography research site.

“New York State is leading the nation in semiconductor manufacturing and R&D, and the installation of this tool for the High NA EUV Lithography Center will allow New York to remain at the forefront of chip innovation,” Governor Hochul said. “This announcement showcases the importance of public-private partnerships and how we can work together to deliver for New Yorkers and the nation, providing cutting-edge technology to support groundbreaking manufacturing right here in this state.

In the coming months, ASML’s High NA EUV lithography system, arguably the most advanced machine ever created, will arrive in sections and be installed inside the new NanoFab Reflection (NFR) building. “First light,” when the tool’s EUV light is first turned on, is expected before the end of the year. This progress follows NFR’s “topping-out” milestone, attended by Governor Hochul in December, when construction teams put in place the building’s final steel beam.

Governor Hochul announced Creates’ High NA EUV Lithography Center in December 2023, a $10 billion partnership which includes $9 billion in industry investment and $1 billion from Empire State Development, with leaders from the semiconductor industry such as IBM, Micron, Applied Materials, Tokyo Electron, and others. The initiative is establishing a next-generation semiconductor research and development center at Creates’ Albany NanoTech Complex to support the R&D of the world’s most complex and powerful semiconductors.  

TEL track being installed in NanoFab Reflection at NY Creates Albany NanoTech Complex

Empire State Development President, CEO and Commissioner Hope Knight said, “New York State has firmly established itself as a global hub of cutting-edge semiconductor research, anchored by world-class assets like the Albany NanoTech Complex and strengthened by unprecedented public-private partnerships. Through targeted, strategic investments, we are building a robust ecosystem that accelerates innovation, supports next-generation technologies, and attracts industry leaders. These efforts are not only advancing the future of chip R&D, but also creating high-quality jobs, expanding opportunity, and securing New York’s leadership in this critical industry for decades to come.”

Senator Charles Schumer said, “The most cutting-edge extreme ultraviolet chip-making technology in the world is being installed right now in the Capital Region’s backyard. This is a major leap forward that will propel American discoveries in chipmaking that scientists today can’t even fathom. My CHIPS & Science Law has delivered major federal investment across Upstate NY to help communities from Syracuse to Albany lead the way in semiconductor manufacturing, and this state-of-the-art High NA EUV Lithography Center will help supercharge those efforts. With this new advanced chipmaking tool being installed, Albany NanoTech is leading the nation in ensuring America stays ahead of China in the race to build the future of technology. I’m grateful for Governor Hochul’s partnership in ensuring the next generation of microchips will be developed here in America, in Upstate NY, not overseas.”

NY Creates President and CEO Dave Anderson said, “As we begin installing the first major tool for our High NA EUV Lithography Center, we’re taking an important step toward enabling the most advanced semiconductor research capabilities in the world. Tokyo Electron’s LITHIUS Pro DICE system will play a foundational role in supporting High NA EUV operations and accelerating breakthroughs with our industry partners, and we are thrilled to be coordinating this initial effort with our longtime collaborators TEL Technology Center, America, based at our site, as well as ASML. This progress reflects New York’s strategic investments and our team’s commitment to driving the next generation of semiconductor innovation for the U.S. right here at our Albany NanoTech Complex.”

TEL track being installed in NanoFab Reflection at NY Creates Albany NanoTech Complex

TEL Technology Center America (TTCA) President Alex Oscilowski said, “The installation of the LITHIUS Pro DICE system at the Albany NanoTech Complex High NA EUV Lithography Center underscores what is possible when the semiconductor ecosystem comes together with a shared commitment to innovation. As High NA EUV comes online, it will accelerate advances in AI, high-performance computing, and the technologies that will shape how the world connects, computes and creates.”

ASML Business Line High NA EUV Head Peter Vanoppen said,“High NA EUV is a critical enabler of the next generation of semiconductor innovation, and the new High NA EUV Center at the Albany NanoTech Complex will create an invaluable R&D environment for industry and research partners to collaborate on the most advanced lithography technology. ASML is proud to support next-generation development at the Center with the forthcoming delivery of an EXE:5200B lithography system, which will help strengthen the U.S. semiconductor ecosystem and accelerate innovation for the future.”

Micron Technology, Inc. EVP and Chief Technology and Product Officer Scott DeBoer said, “The arrival of the first High NA EUV process tool at NY Creates marks a major milestone for advanced semiconductor R&D in New York and the U.S. The High NA EUV Lithography Center is vital for building the R&D ecosystem that drives next-generation Memory and Logic technologies, enabling future high-performance computing and advanced AI. This complements Micron’s mega fab investment, which will create 50,000 jobs by supporting the research, talent and innovation pipeline needed for long-term success. Micron is proud to collaborate at Albany NanoTech, helping strengthen American leadership and resilience in semiconductor manufacturing.”

IBM Research GM of IBM Semiconductors and VP of Hybrid Cloud Mukesh Khare said, “This milestone is an important step forward for the High NA EUV Lithography Center and the innovation ecosystem at the Albany NanoTech Complex. IBM has a long history of pioneering advances in chip technology, including the world’s first 2nm node chip, unveiled in 2021. High NA EUV is essential for sub-2nm scaling, and this capability will accelerate breakthroughs that will shape the future of computing.”

NY Creates’ High NA EUV Lithography Center already provides industry accessibility to standard NA EUV Lithography capabilities. High NA EUV lithography capabilities will allow chip development at the most advanced technology nodes while serving as a platform for additional partner growth with access to Creates’ cutting-edge R&D infrastructure. For more information about the Center and High NA EUV, visit: https://ny-creates.org/euv-lithography-center/.  

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Media Mentions: 

Times Union: New EUV chip center at Albany NanoTech taking shape with deliveries [Paywall]

Photonics Spectra: Albany NanoTech Installs Wafer Coating System: Week in Brief: 04/10/26

ESD: Governor Hochul Announces NY Creates Begins Installation of the First Major Tool for High NA EUV Lithography Center at Albany Nanotech Complex

FingerLakes1.com: New chipmaking milestone in Albany signals New York’s push to lead next era of semiconductor innovation

National Today: New York Begins Installation of Key EUV Lithography Tool

NY Creates Receives Capital Region Chamber ChangeMaker Award

Image courtesy of the TImes Union

NY Creates was honored to be recognized as a 2026 ChangeMaker at the Capital Region Chamber’s Annual Dinner, held at the Albany Capital Center. Creates President & CEO Dave Anderson accepted the award on behalf of the organization, joining more than 1,100 business and civic leaders for an evening focused on connection, community, and regional progress.

The ChangeMaker Award celebrates organizations driving measurable economic impact across the Capital Region. As a leader in semiconductor R&D, Creates is proud to help advance a collaborative innovation ecosystem, fueling next‑generation technologies, strengthening the workforce pipeline, and supporting economic advancement in the region, across the state, the U.S., and beyond.

A big thank‑you to the Chamber for this recognition, and to all our partners, and especially our Creates team members – who help make this work possible. 

Learn more about the impact we’re making at the Albany NanoTech Complex and watch the video HERE.

Creates featured in JETRO, RISE-A Memorandum of Cooperation News Release

Susumu Kataoka, President of JETRO; Kazunori Yamashita, Vice Chairperson of RISE-A
Susumu Kataoka, President of JETRO; Kazunori Yamashita, Vice Chairperson of RISE-A
From left: Susumu Kataoka, President of JETRO; Kazunori Yamashita, Vice Chairperson of RISE-A

“Convening organizations to pursue shared goals is critical to advancing the semiconductor industry. We believe our valued partners’ collaboration will advance economic goals and further strengthen the ties between the thriving American and Japanese semiconductor ecosystems. NY Creates looks forward to continuing our close work together to create new opportunities for innovation, knowledge exchange, and workforce development. Together, we are building semiconductor ecosystems for joint research initiatives and industry engagement that will help accelerate cooperative R&D projects and reinforce the global partnerships that are essential for driving new leading-edge technologies in New York, the U.S., Japan, and beyond.”

– Dave Anderson, NY Creates President and CEO.

JETRO

Mar 19, 2026

Japan External Trade Organization (JETRO) (Chairman: Norihiko Ishiguro, Headquarters: Minato-ku, Tokyo, Japan) and RISE-A, the community/platform for semiconductor stakeholders, mainly established by Mitsui Fudosan with volunteers related to semiconductors.(President: Hiroshi Amano, Headquarters: Chuo-ku, Tokyo, Japan), concluded a Memorandum of Cooperation on March 19, 2026…

Comments:
Susumu Kataoka, President, JETRO

Promoting Japan’s strengths and attractiveness in the semiconductor sector to global audiences, establishing platforms that support domestic and international collaboration, and bridging Japan’s regional semiconductor ecosystems all require strong cooperation among industry-academia government. JETRO has long supported the overseas expansion of Japanese companies, the entry of foreign companies into Japan, and collaboration between Japanese and foreign firms, leveraging its network of more than 70 overseas offices and approximately 50 domestic offices.

We also work to strengthen our support and contribute to the development of Japan’s regional semiconductor ecosystems through partnerships with overseas research institutions, including the U.S.-based semiconductor R&D organization NY Creates.

Through our collaboration with RISE-A, we aim to utilize the organization’s extensive networks among Japanese semiconductor-related companies and academic institutions to contribute to strengthening semiconductor supply chains, advancing next-generation technologies, and promoting the circulation of capital and human resources.

Kazunori Yamashita, Vice Chairperson, RISE-A

RISE-A provides a platform where semiconductor suppliers, users, and supporters—such as government agencies and universities—can collaborate to overcome challenges facing the semiconductor industry and rapidly generate new value. Our goal is to contribute to revitalizing Japan’s semiconductor industry and establishing strong industrial capabilities.

RISE-A has concluded cooperation agreements with NY Creates (U.S.), imec (Belgium), the Industrial Technology Research Institute (ITRI) of Taiwan, AIST Solutions (Japan), and OpenSUSI (Japan) to support industrial development. We are delighted to welcome JETRO as a new partner.

We will leverage the networks and expertise of our partner organizations to plan and develop new events and programs, provide advice to member companies, support networking, and contribute to the formation of an ecosystem in which diverse industry players can participate.

Creates’ Education and Workforce Development Coordinator Meredith O’Connell Selected to City & State’s ’40 Under 40′

Congratulations Meredith O'Connell Image
Congratulations Meredith O'Connell Image

Photo courtesy of Siobhan Mullan, City & State

City & State

“At the Center for Economic Growth, O’Connell has managed 45 apprentices, developed a nanotechnology engineering technician apprenticeship program and worked with partners in semiconductor manufacturing. It’s really cool what’s being created in the Capital Region and just how far it’s sent across the United States and even internationally,” she says.

This year, O’Connell started a new role at NY Creates, a research and development innovation hub, partnering with workforce development employers.

NY Creates’ Albany NanoTech Complex Highlighted in IBM & Lam Research Collaboration Announcement

3D Rendering of Albany NanoTech Complex

NY Creates’ world-class R&D infrastructure continues to play a vital role in advancing next-generation semiconductor innovations. In a recent press release, IBM and Lam Research announced a new collaboration aimed at developing novel materials, advanced fabrication processes, and new High NA EUV lithography processes to support sub-1nm logic scaling that will leverage IBM’s advanced research capabilities located at the NY Creates’ Albany NanoTech Complex.

Read more here: IBM and Lam Research Announce Collaboration to Advance Sub-1nm Logic Scaling

News Coverage:

First Look Tour of NY Creates’ NanoFab Reflection Featured in Times Union

Image courtesy of Times Union

The Times Union just took a tour inside NY Creates’ Albany NanoTech Complex, sharing how “A high-tech powerhouse takes shape in Albany.” The feature article, “First look inside Nanofab Reflection, a computer chip behemoth at Albany NanoTech,” spotlights NanoFab Reflection, our cutting-edge, four-story facility being built to house the world’s most advanced chipmaking tools, as part of Creates’ High NA Extreme Ultraviolet Lithography Center. With a massive cleanroom, cutting-edge EUV lithography capabilities, and construction powering toward “first light” later this year, the article captures how Creates is shaping the future of advanced semiconductors. 

“NY Creates President Dave Anderson told the Times Union during a sit-down interview in his office Wednesday that the building remains on schedule for the keys to be handed over by…the summer.”

 “…We have tools (components) coming in in the middle of April, and the ASML tool will actually be assembled on site over the course of several months, and right now, we’re still on course for what we call ‘first light,’” Anderson said. “We’re finishing the siding on the building, putting up the clean room walls. It’s really a lot of moving parts as you saw.”

Read more HERE [paywall]

Learn more about Creates High NA EUV Lithography Center here

Governor Hochul Celebrates Topping Out of NY Creates’ $1 Billion NanoFab Reflection

NY Creates R&D featured in Times Union: “Capital Region an Epicenter for 3D Chips”

Cleanroom operators at the NY Creates Albany NanoTech Complex
Cleanroom operators at the NY Creates Albany NanoTech Complex

Times Union

“The introduction of (NY Creates’) high NA EUV lithography will enable the development of the most advanced chips that then can be assembled into a 3D package…The new facility, when combined with GlobalFoundries’ planned advanced packaging center in Saratoga County, positions the Capital Region to become a major 3DHI R&D hub.”

Read More HERE. [Paywall]

NY Creates featured in CEG News Release: Capital Region Ushers in the Post-Scaling Era with Chip Stacking R&D

Notional rendering of 3D heterogeneous integration (3DHI). Courtesy of DARPA.

Center for Economic Growth (CEG) Notional rendering of 3D heterogeneous integration (3DHI). Courtesy of DARPA.

The Capital Region is playing a leading role in taking the semiconductor industry in a new direction: vertically, as the focus of R&D shifts from shrinking chips through traditional 2D scaling to the vertical stacking of diverse chiplets to create compact, ultra-high-performance packages via a process called 3D heterogeneous integration (3DHI).

Later this year, the High NA EUV Lithography Center at NY Creates’ Albany NanoTech Complex will start providing high NA EUV lithography, in addition to its existing standard NA EUV lithography capabilities. The introduction of high NA EUV lithography will enable the development of the most advanced chips that then can be assembled into a 3D package. The new facility, when combined with GlobalFoundries’ planned advanced packaging center in Saratoga County, positions the Capital Region to become a major 3DHI R&D hub.

“NY Creates facilitates the fabrication of powerful semiconductor chips with our industry partners, as well as the 3D heterogeneous integration of memory, logic, and photonics at our Albany NanoTech Complex,” said Dave Anderson, President of NY Creates. “We offer accessible standard EUV lithography—and soon High NA EUV lithography—to make those chips that are then processed and assembled into a 3D package. Our High NA EUV Lithography Center will raise the bar for New York’s Capital Region, New York State, and the U.S. by anchoring the world’s most advanced lithography resources in one cooperative ecosystem. In collaboration with industry and academic partners, these efforts are strengthening the region’s semiconductor R&D leadership, driving workforce development, and bolstering economic growth efforts.”

View Original News Release and Read More

NY Creates Highlighted as Key Driver of Region’s Emerging 21st Century Manufacturing Hub in Albany Business Review

Photo of NY Creates’ Albany NanoTech Complex

Albany Business Review / Saratoga Economic Development Corporation (SEDC)

“In Albany, there has been a steadfast focus on and support of the critical nanotechnology sector before many people really understood what that meant,” said Paul Kelly, vice president of strategies, partnerships and new ventures and chief operating officer of NY Creates, the nonprofit organization that owns and operates the Albany NanoTech Complex (ANC), which drives next-gen semiconductor R&D, workforce development and economic advancement. “NY Creates’ Albany NanoTech Complex facilitates research by leading-edge innovation-centered companies from all over the world, with a goal of making the chips and technologies we use every day faster, smaller and more reliable.”

“According to Kelly, the ANC is the most advanced nonprofit owned semiconductor R&D facility in North America, with more than 150,000 square feet of cleanroom space, 50,000 more square feet under construction and an on-site workforce of 3,000. Its major partners include TEL Technology Center, America, LLC, IBM (NYSE: IBM), Applied Materials (NASD: AMAT) and other industry leaders that are reshaping the future through advanced manufacturing.”

Read More